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ヒ化アルミニウム - miniwiki

ヒ化アルミニウム

提供: miniwiki

2013/3/23/ (土) 02:28時点におけるja>KLBot2による版 (ボット: 言語間リンク 9 件をウィキデータ上の d:Q2377230 に転記)

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ヒ化アルミニウム（ヒかアルミニウム、英: aluminium arsenide）は、化学式 AlAs で表される、アルミニウムのヒ化物である。主に半導体材料として用いられる。格子定数はヒ化ガリウムやヒ化アルミニウムガリウムと同じであり、バンドギャップはヒ化ガリウムより広い。

物理的性質

熱膨張係数 5 µm/(℃*m)
デバイ温度 417 K
硬度 5.0 GPa (負荷50g)

^[1]

脚注

↑ L. I. Berger "Semiconductor materials" CRC Press, 1996 ISBN 0849389127, 9780849389122 (available on google books), p. 126

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